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1

Effects of image noise on contact edge roughness and critical dimension uniformity measurement in synthesized scanning electron microscope images

Constantoudis, Vassilios, Kuppuswamy, Vijaya-Kumar Murugesan, Gogolides, Evangelos

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 5.80 MB

english, 2013

2

Nanolithography || Sidewall roughness in nanolithography: origins, metrology and device effects

Constantoudis, V.

Year:

2014

Language:

english

File:

PDF, 2.08 MB

english, 2014

3

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Constantoudis, Vassilios, Papavieros, George, Gogolides, Evangelos, Pret, Alessandro Vaglio, Pathangi, Hari, Gronheid, Roel

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 4.24 MB

english, 2017

4

Photoresist line-edge roughness analysis using scaling concepts

Constantoudis, Vassilios

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2004

Language:

english

File:

PDF, 699 KB

english, 2004

5

Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results

Constantoudis, Vassilios

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2009

Language:

english

File:

PDF, 741 KB

english, 2009

6

Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Kuppuswamy, Vijaya-Kumar Murugesan, Constantoudis, Vassilios, Gogolides, Evangelos, Pret, Alessandro Vaglio, Gronheid, Roel

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 4.78 MB

english, 2013

7

Effects of resist sidewall morphology on line-edge roughness reduction and transfer during etching: is the resist sidewall after development isotropic or anisotropic?

Constantoudis, Vassilios

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2010

Language:

english

File:

PDF, 871 KB

english, 2010

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Sanchez, Martha I., Ukraintsev, Vladimir A., Lorusso, Gian Francesco, Inoue, Osamu, Ohashi, Takeyoshi, Altamirano Sanchez, Efrain, Constantoudis, Vassilios, Koshihara, Shunsuke

Year:

2016

Language:

english

File:

PDF, 992 KB

english, 2016

9

Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution

G.P. Patsis, D. Drygiannakis, V. Constantoudis, I. Raptis, E. Gogolides

Journal:

European Polymer Journal

Year:

2010

Language:

english

File:

PDF, 1.86 MB

english, 2010

10

Contact Edge Roughness: Characterization and modeling

Vijaya-Kumar Murugesan-Kuppuswamy, Vassilios Constantoudis, Evangelos Gogolides

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 687 KB

english, 2011

11

Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations

G.P. Patsis, V. Constantoudis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2004

Language:

english

File:

PDF, 564 KB

english, 2004

12

A review of line edge roughness and surface nanotexture resulting from patterning processes

Evangelos Gogolides, Vassilios Constantoudis, George P. Patsis, Angeliki Tserepi

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 834 KB

english, 2006

13

Plasma Directed Organization of Nanodots on Polymers: Effects of Polymer Type and Etching Time on Morphology and Order

Dimitrios Kontziampasis, Vassilios Constantoudis, Evangelos Gogolides

Journal:

Plasma Processes and Polymers

Year:

2012

Language:

english

File:

PDF, 667 KB

english, 2012

14

Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

Patsis, G. P., Constantoudis, V., Tserepi, A., Gogolides, E., Grozev, G.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2003

Language:

english

File:

PDF, 979 KB

english, 2003

15

[IEEE 2010 27th International Conference on Microelectronics Proceedings - Nis, Serbia (2010.05.16-2010.05.19)] 2010 27th International Conference on Microelectronics Proceedings - Line Width Roughness effects on device performance: The role of the gate width design

Constantoudis, V., Gogolides, E., Patsis, G. P.

Year:

2010

Language:

english

File:

PDF, 532 KB

english, 2010

16

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Gogolides, Evangelos, Constantoudis, Vassilios, Kokkoris, George, Kontziampasis, Dimitrios, Tsougeni, Katerina, Boulousis, George, Vlachopoulou, Marilena, Tserepi, Angeliki

Journal:

Journal of Physics D Applied Physics

Year:

2011

Language:

english

File:

PDF, 2.22 MB

english, 2011

17

Quantification of line-edge roughness of photoresists. II. Scaling and fractal analysis and the best roughness descriptors

Constantoudis, V., Patsis, G. P., Tserepi, A., Gogolides, E.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2003

Language:

english

File:

PDF, 469 KB

english, 2003

18

Three-dimensional geometrical modeling of plasma transfer effects on line edge roughness: comparison with experiments and rules of thumb

Constantoudis, Vassilios, Kokkoris, George, Gogolides, Evangelos

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 2.68 MB

english, 2013

19

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Photoresist line-edge roughness analysis using scaling concepts

Constantoudis, Vasilios, Patsis, George P., Gogolides, Evangelos, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 513 KB

english, 2003

20

Word-length Entropies and Correlations of Natural Language Written Texts

Kalimeri, Maria, Constantoudis, Vassilios, Papadimitriou, Constantinos, Karamanos, Konstantinos, Diakonos, Fotis K., Papageorgiou, Harris

Journal:

Journal of Quantitative Linguistics

Year:

2015

Language:

english

File:

PDF, 446 KB

english, 2015

21

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Correlation length and the problem of line width roughness

Constantoudis, V., Patsis, G. P., Gogolides, E., Archie, Chas N.

Year:

2007

Language:

english

File:

PDF, 278 KB

english, 2007

22

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Characterization and modeling of line width roughness (LWR)

Constantoudis, Vassilios, Gogolides, Evangelos, Roberts, Jeanette, Stowers, Jason K., Silver, Richard M.

Year:

2005

File:

PDF, 707 KB

2005

23

Long-range correlations and burstiness in written texts: Universal and language-specific aspects

Constantoudis, Vassilios, Kalimeri, Maria, Diakonos, Fotis, Karamanos, Konstantinos, Papadimitriou, Constantinos, Chatzigeorgiou, Manolis, Papageorgiou, Harris

Journal:

International Journal of Modern Physics B

Year:

2015

Language:

english

File:

PDF, 871 KB

english, 2015

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Roughness and variability in EUV lithography: Who is to blame? (part 1)

Vaglio Pret, Alessandro, Naulleau, Patrick P., Gronheid, Roel, Younkin, Todd R., Winroth, Gustaf, Biafore, John J., Anno, Yusuke, Hoshiko, Kenji, Constantoudis, Vassilios

Year:

2013

Language:

english

File:

PDF, 529 KB

english, 2013

25

Nanocomposite thin film of Ag nanoparticles embedded in amorphous Al 2 O 3 on optical sensors windows: Synthesis, characterization and targeted application towards transparency and anti-biofouling

Tendero, C., Lazar, A.-M., Samélor, D., Debieu, O., Constantoudis, V., Papavieros, G., Villeneuve, A., Vahlas, C.

Journal:

Surface and Coatings Technology

Year:

2017

Language:

english

File:

PDF, 1.48 MB

english, 2017

26

A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication

Smyrnakis, Athanasios, Zeniou, Angelos, Awsiuk, Kamil, Constantoudis, Vassilios, Gogolides, Evangelos

Journal:

Frontiers of Chemical Science and Engineering

Year:

2019

Language:

english

File:

PDF, 3.29 MB

english, 2019

27

A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication

Smyrnakis, Athanasios, Zeniou, Angelos, Awsiuk, Kamil, Constantoudis, Vassilios, Gogolides, Evangelos

Journal:

Frontiers of Chemical Science and Engineering

Year:

2019

File:

PDF, 3.29 MB

2019

28

Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology

Prud'homme, Nathalie, Constantoudis, Vassilios, Turgambaeva, Asiya E., Krisyuk, Vladislav V., SamÃ©lor, Diane, Senocq, FranÃ§ois, Vahlas, Constantin

Journal:

Thin Solid Films

Year:

2020

File:

PDF, 2.60 MB

2020

29

Modeling of line edge roughness transfer during plasma etching

V. Constantoudis, G. Kokkoris, P. Xydi, G.P. Patsis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2009

Language:

english

File:

PDF, 300 KB

english, 2009

30

Effects on surface morphology of epitaxial Y2O3 layers on Si (001) after postgrowth annealing

V. Ioannou-Sougleridis, V. Constantoudis, M. Alexe, R. Scholz, G. Vellianitis, A. Dimoulas

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 692 KB

english, 2004

31

Classical scattering from oscillating targets

P.K. Papachristou, F.K. Diakonos, V. Constantoudis, P. Schmelcher, L. Benet

Journal:

Physics Letters A

Year:

2002

Language:

english

File:

PDF, 211 KB

english, 2002

32

Control of Nanotexture and Wetting Properties of Polydimethylsiloxane from Very Hydrophobic to Super-Hydrophobic by Plasma Processing

Katerina Tsougeni, Angeliki Tserepi, George Boulousis, Vassilios Constantoudis, Evangelos Gogolides

Journal:

Plasma Processes and Polymers

Year:

2007

Language:

english

File:

PDF, 373 KB

english, 2007

33

Effects of lithography non-uniformity on device electrical behavior. Simple stochastic modeling of material and process effects on device performance

George P. Patsis, Vassilios Constantoudis, Evangelos Gogolides

Journal:

Journal of Computational Electronics

Year:

2006

Language:

english

File:

PDF, 348 KB

english, 2006

34

Entropy analysis of natural language written texts

C. Papadimitriou, K. Karamanos, F.K. Diakonos, V. Constantoudis, H. Papageorgiou

Journal:

Physica A: Statistical Mechanics and its Applications

Year:

2010

Language:

english

File:

PDF, 480 KB

english, 2010

35

Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation

E. Gogolides, C. Boukouras, G. Kokkoris, O. Brani, A. Tserepi, V. Constantoudis

Journal:

Microelectronic Engineering

Year:

2004

Language:

english

File:

PDF, 274 KB

english, 2004

36

Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography

Stefan Eder-Kapl, Hans Loeschner, Michalea Zeininger, Wolfgang Fallmann, Oliver Kirch, George P. Patsis, V. Constantoudis, Evangelos Gogolides

Journal:

Microelectronic Engineering

Year:

2004

Language:

english

File:

PDF, 227 KB

english, 2004

37

Fractals and device performance variability: The key role of roughness in micro and nanofabrication

V. Constantoudis, G.P. Patsis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2012

Language:

english

File:

PDF, 550 KB

english, 2012

38

Contact edge roughness metrology in nanostructures: Frequency analysis and variations

M.K. Vijaya-Kumar, Vassilios Constantoudis, Evangelos Gogolides, Alessandro Vaglio Pret, Roel Gronheid

Journal:

Microelectronic Engineering

Year:

2012

Language:

english

File:

PDF, 1.36 MB

english, 2012

39

Roughness characterization in positive and negative resists

Vassilios Constantoudis, Evangelos Gogolides, Angeliki Tserepi, Constantinos D. Diakoumakos, Evangelos S. Valamontes

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 150 KB

english, 2002

40

Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis

George P. Patsis, Vasilios Constantoudis, Angeliki Tserepi, Evangelos Gogolides, Grozdan Grozev, Thomas Hoffmann

Journal:

Microelectronic Engineering

Year:

2003

Language:

english

File:

PDF, 266 KB

english, 2003

41

Roughness Formation During Plasma Etching of Composite Materials: A Kinetic Monte Carlo Approach

Zakka, Eleni, Constantoudis, Vassilios, Gogolides, Evangelos

Journal:

IEEE Transactions on Plasma Science

Year:

2007

Language:

english

File:

PDF, 584 KB

english, 2007

42

Nanoscale Protein Patterning on Si Substrates using Colloidal Lithography and Plasma Processing

A. Malainou, K. Ellinas, P.S. Petrou, S.E. Kakabakos, V. Constantoudis, E. Gogolides, A. Tserepi

Journal:

Procedia Engineering

Year:

2011

Language:

english

File:

PDF, 389 KB

english, 2011

43

Plasma Nanotextured PMMA Surfaces for Protein Arrays: Increased Protein Binding and Enhanced Detection Sensitivity

Tsougeni, K., Tserepi, A., Constantoudis, V., Gogolides, E., Petrou, P. S., Kakabakos, S. E.

Journal:

Year:

2010

Language:

english

File:

PDF, 4.40 MB

english, 2010

44

Solution processable tungsten polyoxometalate as highly effective cathode interlayer for improved efficiency and stability polymer solar cells

Palilis, Leonidas C., Vasilopoulou, Maria, Douvas, Antonios M., Georgiadou, Dimitra G., Kennou, Stella, Stathopoulos, Nikolaos A., Constantoudis, Vassilios, Argitis, Panagiotis

Journal:

Solar Energy Materials and Solar Cells

Year:

2013

Language:

english

File:

PDF, 861 KB

english, 2013

45

Hyperacceleration in a Stochastic Fermi-Ulam Model

Karlis, A. K., Papachristou, P. K., Diakonos, F. K., Constantoudis, V., Schmelcher, P.

Journal:

Physical Review Letters

Year:

2006

Language:

english

File:

PDF, 194 KB

english, 2006

46

All-Organic Sulfonium Salts Acting as Efficient Solution Processed Electron Injection Layer for PLEDs

Georgiadou, Dimitra G., Vasilopoulou, Maria, Palilis, Leonidas C., Petsalakis, Ioannis D., Theodorakopoulos, Giannoula, Constantoudis, Vassilios, Kennou, Stella, Karantonis, Antonis, Dimotikali, Dimit

Journal:

ACS Applied Materials & Interfaces

Year:

2013

Language:

english

File:

PDF, 4.60 MB

english, 2013

47

Tailoring the surface topography and wetting properties of oxygen-plasma treated polydimethylsiloxane

Tserepi, Angeliki, Gogolides, Evangelos, Tsougeni, Katerina, Constantoudis, Vassilios, Valamontes, Evangelos S.

Journal:

Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 579 KB

english, 2005

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advanced Etch Technology for Nanopatterning II - Toward an integrated line edge roughness understanding: metrology, characterization, and plasma etching transfer

Gogolides, Evangelos, Constantoudis, Vassilios, Kokkoris, George, Zhang, Ying, Oehrlein, Gottlieb S., Lin, Qinghuang

Year:

2013

Language:

english

File:

PDF, 2.03 MB

english, 2013

49

Large work function shift of organic semiconductors inducing enhanced interfacial electron transfer in organic optoelectronics enabled by porphyrin aggregated nanostructures

Vasilopoulou, Maria, Douvas, Antonios M., Georgiadou, Dimitra G., Constantoudis, Vassilios, Davazoglou, Dimitris, Kennou, Stella, Palilis, Leonidas C., Daphnomili, Dimitra, Coutsolelos, Athanassios G.

Journal:

Year:

2014

Language:

english

File:

PDF, 1.49 MB

english, 2014

50

Tunable Poly(dimethylsiloxane) Topography in O 2 or Ar Plasmas for Controlling Surface Wetting Properties and Their Ageing

Tsougeni, Katerina, Tserepi, Angeliki, Boulousis, George, Constantoudis, Vassilios, Gogolides, Evangelos

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 348 KB

english, 2007